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CNT Graphene Synthesis

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Nanoscience > CNT/ Graphene Synthesis

CVD Furnace System Model Type : MPCNT-Graphene


 

The system is designed for growing CNT or graphene materials by CVD process. Quenching can be realized by rapidly sliding the hot zoon of the furnace away from the specimen

 

Heater Unit
Electric furnace: Use temperature:400~1000deg C
maximum use temperature:1100 deg C
power source:AC200V/20A/single phase programmable temperature control manual control of the furnace sliding action
Quartz tube: heatproof temperature:<1100 deg C
size:O.D.50(I.D.45)*L1000mm
Gas Unit
Mass flowgas Controllers Gaseous: Species: inert gas [N2 or Ar]
reducing gas [H2]
hydrocarbon gas
[C2H2 or C2H4 or CH4]
Flow range:order
Liquid Fuel Input Unit
liquid flowmeter Fluid kind:C2H5OH
Flow range:order
Ethanol tank: Capacity:500ml
Exhaust Unit
oil sealed rotary pump Effective exhaust Velocity:20~24L/min
Attainment pressure:1.3Pa
Power source:AC100V

 

MPCNT-Basic benchtop carbon nanotube synthesizing apparatus.

MPCNT-Basic benchtop carbon nanotube synthesizing apparatus

Carbon nanotube synthesizing apparatus is simplified by using ethanol as the carbon source. Also you can also use organic liquid methanol, xylene, and benzene.

Ethanol is a very convenient material for the generation of carbon nanotubes. Highly crystalline CNT SWCNT and is likely to be generated. Moreover, in order to decompose at a lower temperature than hydrocarbon gas, strongly reducing action of the metal, can be used as a catalyst as powder material (Fe, Ni, Co, SUS, NiCu ...) a variety of commercial production process of carbon nanotubes You can be more conveniently.

Vertically aligned carbon nanotubes can be grown with high crystalline various substrates (silicon, quartz, stainless steel, metal, ceramics, etc.) and, on the carrier. Easy, the entire process can be completed in just 20 to 30 minutes may also want a compact size.

In addition, the use of transparent glass chamber, you can visually instantaneous generation CNT.

Incidentally, the CNT grown orientation, it is necessary to exclude the alloy substrate such as Ni and Fe some generally keep pre-catalyst film deposited on the substrate sample. I can provide the substrate with the catalyst film as consumables from us, you can also catalyze the deposition film forming apparatus in your own. Also, if you wish, a self-contained system to CNT growth from catalyst formation MPCNT-Premium and multi-function vacuum deposition apparatus we are recommended.

It is a CVD apparatus is heated in an atmosphere of ethanol under reduced pressure to a substrate with a catalyst prepared in advance, the synthesis of vertically aligned CNT. Moreover, if placed on the heater and heated powder catalyst, CNT powder type is generated.



Grown on a silicon substrate with the catalyst film 
vertically aligned CNT


CNT grown directly on alloy NiCu. 
Since the Ni component in the substrate acts as a catalyst for the CNT, 
the deposition of the catalyst is not required in this case prior.

 

Basic Configuration
Body Pyrex chamber 
purge gas introduction line 
pump exhaust line 
Lee Klein 
vacuum gauge 
port current introduction terminal 
W400 mm × H230 mm × D265 mm dimensions:
Heater 25 mm × 40 mm 
conventional temperature: 400 ~ 800 ℃
Power 400W: rated output power 
50-60Hz single phase AC90-250 
W110 mm × H130 mm × D405 mm dimensions:
Air displacement pump Rotary pump
Crucibles for liquid fuel
Options
Radiation thermometer

 

MPHF hot filament CVD film forming apparatus

MPHF hot filament CVD film forming apparatus

CVD is a surface treatment apparatus equipped with a compact tabletop (hot wire) hot filament.

Can be heated to up to 2000 ℃ W filament near the sample provided, I will promote the decomposition of various reaction gases. Film is formed (radical) is deposited on the sample surface active species generated by the decomposition gas.

(DLC) film can be produced diamond-like carbon filaments by high-temperature decomposition of hydrocarbon gas such as methane, both conductive and corrosion resistance.

By degrading heated by heating mechanism filament precursor nitrogen, you can while in situ ammonia gas, heated to a high temperature the material various substrates, and the nitride or nitrogen doping. Since it does not require preparation of ammonia gas cylinder, you can experiment without selecting a location and environment.

cylinder, you can experiment without selecting a location and environment.


Filament substrate placed on top


The use of methane gas, DLC was deposited on WC: Left
by the use of nitrogen precursor, Right: 
gold titanium nitride film formed on the Ti surface

Nitrogen-doped CNT obtained by nitriding treatment of the carbon nanotubes. Change in the shape of a hollow tube-shaped bamboo from the crystal structure of the CNT.

 


Basic Configuration
Body Pyrex chamber 
purge gas introduction line 
source gas introduction line 
pump exhaust line 
Lee Klein 
vacuum gauge 
port current introduction terminal
Substrate heater 25 mm × 40 mm 
conventional temperature: 400 ~ 800 ℃
Substrate heater power supply 400W: rated output power 
50-60Hz single phase AC90-250 
W110 mm × H130 mm × D405 mm dimensions:
Filament heater 2000 degrees temperature: regular
Filament heater power supply 400W: rated output power 
50-60Hz single phase AC90-250 
W110 mm × H130 mm × D405 mm dimensions:
Air displacement pump Rotary pump

 

MPVAP-powder multi-function vacuum deposition apparatus.

This vacuum vapor deposition apparatus for coating various metal thin film on the surface of the sample of granular and powder type.

By allowing the evaporated down from above the evaporation source, we have to allow the deposition of particulate samples can not be fixed.

Equipped with a vibration sample stage our idea, you can be deposited while rotating the sample vibration.

The rotation of the particles deposited uniformly on each side is possible particles, plaque deposition can be significantly improved.

It is also possible that your existing vacuum deposition apparatus, the evaporation crucible mounted upside down and incorporate our vibration sample stage, please feel free to contact us.

Main Specifications

High vacuum exhaust system (roughing pump turbo pump +) evaporation source 2 quartz crystal film thickness monitor vibration sample system

 

MPCVD-75-3 generator CVD nanocarbon.

MPCVD-75-3 generator CVD nanocarbon

CVD is generating apparatus using carbon nano (75mmφ) quartz tube furnace 3 zone independent temperature control of the heater. High temperature uniformity, less plaque generation. Generation and the deposition of carbon nanotubes, various carbon nano-coil, carbon micro coil, such as graphene is possible.

I comprises introducing mechanism outside of the catalyst precursor. Can be grown CNT while supporting the catalyst, the carrier silicon, quartz, ceramics, or oxide, the catalyst is no longer necessary adjustment separately. (CNT composite material having a structure of highly dispersed core shell matrix CNT / CNT composite materials see us is useful in the development of).

Provides a mechanism for ethanol evaporation, the system introduced ethanol, ethanol vapor can be introduced. It is effective for the generation of SWCNT. In addition, by introducing ethanol vapor instead of to introduce steam generating cocatalyst CMC, you will be able to generate efficiently carbon nanocoil carbon microcoil.

With the introduction of the catalyst precursor, from the surface of the alumina particles  long As-grown CNT bundles grown in all directions

The CMC is produced by introducing acetylene gas and co-catalyst

Basic Configuration
Tubular furnace 400 ~ 1100 ℃ temperature normal working 
length 200mm soaking 
zone temperature control temperature controller 3 
Dimensions W890 × H700 × D420mm 
75mmφ tube OD adaptation 
AC200 30A single-phase breaker capacity 
75kg weight
Core tube Size 74φ × L1220mm 
tube 2 1/2 inlet tube
Gas control Flowmeter gas mixture 
N2/H2/CH4 introduced gas species (changeable)
Introduction of liquid fuel [Synthesis CNT] 
introduced a co-catalyst [Synthesis CMC]
Flask 
heater for vaporizing 
gas inlet line
Introduction of catalyst precursor Tube 
heater for sublimation 
gas inlet line
Vacuum gauge Vacuum gauge Bourdon tube
Air displacement pump Rotary pump

 

MPCVD-120 generator CVD nanocarbon.

MPCVD-120 generator CVD nanocarbon

CVD carbon nano generation equipment using quartz tube furnace (120mmφ) large-diameter three-zone temperature control heater. Orientation of the substrate and is best suited for large-area CNT, CNT type to generate a large amount of powder of high yield.

Hydrocarbon gas introduction to the system, equipped with a precise mass flow control system. Introduction to the system ethanol was prepared prior evaporation function.

And a screw rotating mechanism provided inside the quartz reaction tube, we have continuous or intermittent to allow generation of the CNT and the recovery mechanism of the CNT external deployment mechanism catalysts and catalyst supports have been generated.


Conceptual diagram of continuous recovery mechanism of CVD product

Basic Configuration
Tubular furnace Normal working temperature of 400 ~ 1100 ℃ 
soaking length 250mm 
with 3 zone temperature controller temperature control program 
Dimensions W940 × H810 × D510mm 
adaptation 120mmφ tube OD 
capacity AC200 30A 3-phase breaker 
weight 165kg
Core tube Size 120φ × L1400mm 
two pipe 1/2 inlet tube
Gas control Gas mass flow equation blender 
N2/H2/CH4 introduced gas species (changeable)
Introduction of liquid fuel [Synthesis CNT] 
introduced a co-catalyst [Synthesis CMC]
Flask 
heater for vaporizing 
gas inlet line
Introduction of catalyst precursor Tube 
heater for sublimation 
gas inlet line
With recovery mechanism and product supply catalyst carrier
Vacuum gauge Vacuum gauge Bourdon tube
Air displacement pump Rotary pump

 

 

 

 

 

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