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Thinfilm Metrology > Thin Film Measurement System

 

F10-RT Thin-Film Analyzer

 

Simultaneous Reflectance/Transmittance Measurements for Thin-Film Applications
The F10-RT requires only a mouse-click to capture both reflectance and transmittance spectra by eliminating timeconsuming changes in hardware configuration. Data capture is fast – the array-based spectrometers typically take less than a second.


The Analysis Advantage
The F10-RT brings the power of Filmetrics analysis to simultaneous reflectance and transmittance measurements. A click of the mouse instantly reports minimum and maximum reflectance and transmittance values in user-configurable wavelength ranges. Color analysis is standard and can be displayed in common color-space systems (e.g. CIELAB and CIEXYZ) as well as visually. Measured spectra and other data can easily be printed and exported or can be saved in JPEG image format for easy distribution. Optional film thickness and index solving modules give the F10-RT all of the advanced multi-film analytical power of the Filmetrics F20.


All in a Robust, Reliable Package

The F10-RT arrives complete with reference standards. Its small footprint and USB connectivity ensure effortless setup. With no moving parts, no maintenance other than lamp replacement is necessary and high reliability is guaranteed.

 

The Filmetrics Advantage

  • Built-in online diagnostics
  • Standalone software included
  • Sophisticated history function for saving, reproducing, and plotting results

 

 

 

Thickness1

Measurement Range*:

15 nm-70 μm

Min. Thickness Req’d to Measure n and k*:           100 nm

Accuracy*:

Greater of 0.4% or 2 nm

Precision2:

0.1 nm

Stability3:

0.07 nm

Spectrometer

Wavelength Range§:

380-1050 nm

Wavelength Accuracy:

< 0.5 nm

Wavelength Reproducibility:

0.1 nm

Wavelength Resolution:

2.5 nm

Photometric Accuracy:

0.005 A

Noise:

< 0.0002 A rms

Stray Light:

< 0.25% at 500 nm

Amplitude Resolution:

14-bit

General

Probe Spot Size:

6 mm

Light Source:

Regulated Tungsten-Halogen

Lamp Warm Up Time for High Precision:            15 minutes

Power Requirements:

100-240 VAC, 50-60 Hz, 20W

Computer Requirements

Operating System:     Windows XP(SP2) - Windows 8 (64-bit)

Processor Clock Speed:

1.4 GHz min

System Memory:

512 MB min

Hard Disk Space:

50 MB min

Interface:

USB 1.0 (USB 2.0 recommended)

Screen Resolution:

1024 x 768 min

Internet Access:

Recommended for online support

 

§ UV, NIR, and EXR configurations available
* Material dependent.
1 Thickness & index solving are optional.
2 1σ of 100 measurements of 500 nm SiO2-on-Si. Average of 1σ over 20 successive days.
3 2σ of daily average of 100 measurements of 500 nm SiO2-on-Si over 20 successive days.

 

 

F20 Thin-Film Analyzer

 

An Advanced Thin-Film Measurement System at an Affordable Price
Thickness and optical constants (n and k) are measured quickly and easily with the affordable F20 advanced spectrometry system. Spectral analysis of reflectance from the top and bottom of the thin film provides thickness,
refractive index, and extinction coefficient in seconds.


The included software and USB connectivity make installing the F20 onto any Windows-platform PC simple. The robust software comes preloaded with a library of over one hundred materials, which facilitates the measurements of many different layer structures, including single and multilayer stacks, and freestanding films. New materials can be added quickly by measuring the optical constants of samples or by importing data from an existing source.

 

Example Layers
Virtually any smooth, translucent, or lightly absorbing film may be measured. This includes most dielectrics and semiconductors, for example:

SiO2 SiNX DLC
Photoresist Polymer Layers Polyimide
Polysilicon Amorphous Silicon Silicon

 

Applications

SEMICONDUCTOR FABRICATION
• Photoresist
• Oxides
• Nitride
SEMICONDUCTOR FABRICATION
• Photoresist
• Oxides
• Nitride
   
SEMICONDUCTOR FABRICATION
• Photoresist
• Oxides
• Nitride
SEMICONDUCTOR FABRICATION
• Photoresist
• Oxides
• Nitride

 

The Filmetrics Advantage

  • World’s leader in tabletop thin-film measurement
  • 24hr phone, e-mail, and online support
  • Intuitive analysis software standard with every system


Additional Features

  • Built-in online diagnostics
  • Standalone software included
  • Sophisticated history function for saving, reproducing, and plotting results


 

 

 

 

F20-UV

F20-UVX

F20

F20-EXR

F20-NIR

F20-XT

Thickness
Measurement Range*:

3 nm-
40 μm

3 nm-
250 μm

15 nm-
70 μm

15 nm-
250 μm

100 nm-
250 μm

0.2 μm -
450 μm

Min. Thickness to Measure n & k*:

50 nm

50 nm

100 nm

100 nm

500 nm

2 μm

Accuracy*: The > of 0.2% or

1 nm

1 nm

2 nm

2 nm

3 nm

5 nm

Precision1:

0.02 nm

0.02 nm

0.02 nm

0.02 nm

0.1 nm

1 nm

Stability2:

0.05 nm

0.05 nm

0.05 nm

0.05 nm

0.12 nm

1 nm

Spot Size:

Standard 1.5 mm, Optional down to 20 μm

600 μm

Sample Size:

From 1 mm to 300 mm diameter and up

 

Light Source Lamp MTBF:

D2: 2000 hr, Halogen: 1200 hr

 

Halogen: 1200 hr

Spectrometer

Wavelength Range:

200-
1100 nm

200-
1700 nm

380-
1050 nm

380-
1700 nm

950-
1700 nm

1440-
1690 nm

 

 

General

Power Requirements:

100-240 VAC, 50-60 Hz, 0.3-0.1 A

Interface:

USB 2.0

Certifications:

CE EMC and safety directives

Operating System

PC:

Windows XP(SP2) - Windows 8(64-bit)

Mac:

OS X Lion/Mountain Lion running Parallels


* Material dependent
1 1σ of 100 measurements of 500 nm SiO2-on-Si. Average of 1σ over 20 successive days.
2 2σ of daily average of 100 measurements of 500 nm SiO2-on-Si over 20 successive days.

 

 

F50 Thin-Film Analyzer

 

Automated Thin-Film Thickness Mapping System
Thin-film thickness of samples up to 450 mm in diameter are mapped quickly and easily with the F50 advanced spectral reflectance system. The motorized r-theta stage moves automatically to selected measurement points and provides thickness measurements as fast as two points per second. The F50 has the same precision high-lifetime stage that performs millions of measurements in our production systems.


Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points. The entire desktop system is set up in minutes and can be used by anyone with basic computer skills.

Example Layers
Virtually any smooth, non-metallic film may be measured. Examples include:

 

SiO2 SiNX DLC
Photoresist Polymer layers Polyimide
Polysilicon Amorphous Silicon  

 

SEMICONDUCTOR FABRICATION
• Photoresist
• Oxides/Nitrides/SOI
• Wafer Backgrinding/Packaging
LIQUID CRYSTAL DISPLAYS
• Cell Gaps
• Polyimide
• ITO
   
OPTICAL COATINGS
• Hardness Coatings
• Anti-Reflection Coating
• Filters
MEMS
• Photoresist
• Silicon Membranes
• AlN/ZnO Thin-Film Filters


The Filmetrics Advantage

  • 24-hour Support
  • Built-in online diagnostics
  • Standalone software included
  • Sophisticated history function for saving, reproducing,and plotting results

 

 

 

  F50-UVX    F50-UV     F50   F50-EXR  F50-NIR   F50-XT F50-XXT

Thickness Measurement Range*:

5 nm-250 µm

5 nm-40 µm

20 nm-70 µm

20 nm-250 µm

100 nm-250 µm

0.2 μm-450 μm

5 μm-3 mm

Min. Thickness to Measure n and k*:

50 nm

50 nm

100 nm

100 nm

500 nm

2 μm

100 μm

Wavelength Range:

200-1700 nm

200-1100 nm

380-1050 nm

380-1700 nm

950-1700 nm

1440-1690 nm

1520-1580 nm

Accuracy*: The > of 0.4% or

1 nm

1 nm

2 nm

2 nm

3 nm

5 nm

50 nm

Precision1:

0.1 nm

0.2 nm

1 nm

5 nm

Stability2:

0.07 nm

0.12 nm

1 nm

5 nm

Spot Size:

Standard 1.5 mm (Smaller Available)

600 μm

25 μm

 

Light Source Lamp MTBF:

D2: 2000 hr, Halogen: 1200 hr

 

Halogen: 1200 hr

 

>10 years

 

 

200 mm Chuck

300 mm Chuck

Sample Size:

≤ 200 mm diameter

≤ 300 mm diameter

 

Speed (Typical with
Vacuum Chuck):

5 points - 5 sec.
25 points - 14 sec.
56 points - 29 sec.

5 points - 8 sec.
25 points - 21 sec.
56 points - 43 sec.

 

General

Power Requirements:

100-240 VAC, 50-60 Hz, 230 Watts

 

Dimensions:

14W x 19D x 11H (in)
35.5W x 48.3D x 28H (cm)

Weight:

35 lbs. (16 kg)

Computer Requirements

Interface:

USB 2.0

Operating System

PC3:

Windows XP(SP2) - Windows 8(64-bit)

Mac:

OS X Lion/Mountain Lion running Parallels

 

* Material dependent

 ¹ 1σ of 100 measurements of 500 nm SiO -on-Si. Average of 1σ over 20 successive days.
 2  2σ of daily average of 100 measurements of 500 nm SiO2-on-Si over 20 successive days.
 3 Windows Vista – Windows 8(64-bit) and a DirectX 10 graphics card required to render 3D wafer maps

 

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