Introducing the second generation of plasma sources which can be configured as Atom Sources, Ion Sources and Atom/Ion Hybrid Sources.
Electron Beam Evaporator
Atomic Hydrogen Source
Thermal hydrogen cracker
The new H-flux Atomic Hydrogen Source* works by thermally dissociating hydrogen in an electron bombardment heated fine tungsten capillary (thermal hydrogen cracker). By bouncing along the hot walls the molecular hydrogen is cracked to atomic hydrogen. This is e.g. very useful for in-situ, damage free cleaning of residual oxygen prior to sample coating or analysis. Other applications are in surface modifications appreciating the high reactivity of atomic species.
The H-flux Atomic Hydrogen Source is UHV compatible and mounted on a NW35CF (2.75"OD) flange, making the source an easy retrofit to existing vacuum systems.
Atomic Hydrogen can be used in surface science and thin film technolgy (MBE, GSMBE) mainly for the following applications:
IonEtch Sputter Gun
Sputter Ion Gun for sample cleaning
Sputter Ion Gun
The tectra IonEtch ion gun is a filamentless ion source based on a microwave plasma discharge. Like its big brother the Plasma Ion Source, the IonEtch works by coupling microwave energy into a coaxial waveguide and from there via evanescent wave coupling, into a plasma chamber. The intense oscillating electric fields cause the gas to breakdown and a plasma discharge to take place. A quadrupole magnetic field around the chamber further enhances the plasma density via the Electron Cyclotron Resonance (ECR) effect. Ions are extracted from the plasma using simple two or three grid single-hole extraction optics.
The use of microwaves to sustain the plasma allows ions to be extracted at very low energies without the plasma collapsing (down to 25eV) and since there are no hot metal electrodes in the plasma also permits the use of reactive gases such as oxygen and hydrogen.
The new GenII is the second generation of the IonEtch sputter gun with some significant improvements in performance and features. To name only some: higher total beam current, high efficiency direct microwave coupling without need of tuning, Alumina plasma cup now standard, only 4 screws to undo non-bakeable parts and more compact, space saving air side setup. Besides the standard version a high current version of the IonEtch sputter gun is available with up to 4mA ion current and 120µA/cm² at 100 mm working distance.
Tectra has over ten years experience in the supply of Microchannel Plates (MCP) and MCP detectors / phosphor particle detectors. Benefiting from this experience tectra is now selling world wide its full range of MCPs and MCP based detectors.
For customers who have already designed their own MCP detector mount and need replacement microchannel plates, then tectra offers a complete range of very competitively priced nude standard MCPs and extended dynamic range MCPs (for high input currents MCPs). Our microchannel plates are available in all the well used standard circular OD formats e.g 12, 18, 25, 33, 50 and 87mm (MCP specifications). In addition we are also able to offer a customization service to bring you the MCP size that you need.
However our forte lies in the wide variety of mounted MCP configurations that we offer. Whether you require a single, double (Chevron) or Z stack resistance matched MCP coupled to a standard anode giving ~ 40ns time response or whether you need a fast anode for ion or electron time-of-flight detector with sub ns timing, then tectra has the off the shelf solution for you. Alternatively you may need to image or profile your ion/electron beam / soft x-ray / photon or other molecular or sub atomic particle. For these applications we offer MCPs together with high quality phosphor screens offering industry leading spatial resolution. When it comes to phosphors we offer the standard P20, P43 and P47 and have developed additional phosphors for fast timing requirements.
MCP Assembly with phosphor screen, standard flanges selection table
Besides nude Microchannel Plates (MCP) we offer complete mounted MCPs as fast sub ns detectors for electron and ion time-of flight as well as MCP phosphor based imaging detectors for profiling of ion / electron beam / soft x-ray / photon or other molecular or sub atomic particles.
For high input currents our configurations are available with extended dynamic range MCPs. In addition the configurations are available with single, double and z stack MCP detectors. All the above combinations can be purchased stand alone or flange mounted with the appropriate high voltage feedthroughs.
MCP detectors for in-vacuum mount and flange mountedSo whether you need a phosphor image intensifier based MCP detector or a standard / fast anode MCP detector then Tectra has the off the shelf solution for you.
MCP detectors are offered with: