F10-RT Thin-Film Analyzer
Simultaneous Reflectance/Transmittance Measurements for Thin-Film Applications
The F10-RT requires only a mouse-click to capture both reflectance and transmittance spectra by eliminating timeconsuming changes in hardware configuration. Data capture is fast – the array-based spectrometers typically take less than a second.
The Analysis Advantage
The F10-RT brings the power of Filmetrics analysis to simultaneous reflectance and transmittance measurements. A click of the mouse instantly reports minimum and maximum reflectance and transmittance values in user-configurable wavelength ranges. Color analysis is standard and can be displayed in common color-space systems (e.g. CIELAB and CIEXYZ) as well as visually. Measured spectra and other data can easily be printed and exported or can be saved in JPEG image format for easy distribution. Optional film thickness and index solving modules give the F10-RT all of the advanced multi-film analytical power of the Filmetrics F20.
All in a Robust, Reliable Package
The F10-RT arrives complete with reference standards. Its small footprint and USB connectivity ensure effortless setup. With no moving parts, no maintenance other than lamp replacement is necessary and high reliability is guaranteed.
The Filmetrics Advantage
|Measurement Range*:||15 nm-70 μm|
|Min. Thickness Req’d to Measure n and k*: 100 nm|
|Accuracy*:||Greater of 0.4% or 2 nm|
|Wavelength Range§:||380-1050 nm|
|Wavelength Accuracy:||< 0.5 nm|
|Wavelength Reproducibility:||0.1 nm|
|Wavelength Resolution:||2.5 nm|
|Photometric Accuracy:||0.005 A|
|Noise:||< 0.0002 A rms|
|Stray Light:||< 0.25% at 500 nm|
|Probe Spot Size:||6 mm|
|Light Source:||Regulated Tungsten-Halogen|
|Lamp Warm Up Time for High Precision: 15 minutes|
|Power Requirements:||100-240 VAC, 50-60 Hz, 20W|
|Operating System: Windows XP(SP2) - Windows 8 (64-bit)|
|Processor Clock Speed:||1.4 GHz min|
|System Memory:||512 MB min|
|Hard Disk Space:||50 MB min|
|Interface:||USB 1.0 (USB 2.0 recommended)|
|Screen Resolution:||1024 x 768 min|
|Internet Access:||Recommended for online support|
§ UV, NIR, and EXR configurations available
* Material dependent.
1 Thickness & index solving are optional.
2 1σ of 100 measurements of 500 nm SiO2-on-Si. Average of 1σ over 20 successive days.
3 2σ of daily average of 100 measurements of 500 nm SiO2-on-Si over 20 successive days.
F20 Thin-Film Analyzer
An Advanced Thin-Film Measurement System at an Affordable Price
Thickness and optical constants (n and k) are measured quickly and easily with the affordable F20 advanced spectrometry system. Spectral analysis of reflectance from the top and bottom of the thin film provides thickness,
refractive index, and extinction coefficient in seconds.
The included software and USB connectivity make installing the F20 onto any Windows-platform PC simple. The robust software comes preloaded with a library of over one hundred materials, which facilitates the measurements of many different layer structures, including single and multilayer stacks, and freestanding films. New materials can be added quickly by measuring the optical constants of samples or by importing data from an existing source.
Virtually any smooth, translucent, or lightly absorbing film may be measured. This includes most dielectrics and semiconductors, for example:
The Filmetrics Advantage
|0.2 μm -
|Min. Thickness to Measure n & k*:||50 nm||50 nm||100 nm||100 nm||500 nm||2 μm|
|Accuracy*: The > of 0.2% or||1 nm||1 nm||2 nm||2 nm||3 nm||5 nm|
|Precision1:||0.02 nm||0.02 nm||0.02 nm||0.02 nm||0.1 nm||1 nm|
|Stability2:||0.05 nm||0.05 nm||0.05 nm||0.05 nm||0.12 nm||1 nm|
|Spot Size:||Standard 1.5 mm, Optional down to 20 μm||600 μm|
|Sample Size:||From 1 mm to 300 mm diameter and up|
|Light Source Lamp MTBF:||D2: 2000 hr, Halogen: 1200 hr||Halogen: 1200 hr|
* Material dependent
1 1σ of 100 measurements of 500 nm SiO2-on-Si. Average of 1σ over 20 successive days.
2 2σ of daily average of 100 measurements of 500 nm SiO2-on-Si over 20 successive days.
F50 Thin-Film Analyzer
Automated Thin-Film Thickness Mapping System
Thin-film thickness of samples up to 450 mm in diameter are mapped quickly and easily with the F50 advanced spectral reflectance system. The motorized r-theta stage moves automatically to selected measurement points and provides thickness measurements as fast as two points per second. The F50 has the same precision high-lifetime stage that performs millions of measurements in our production systems.
Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points. The entire desktop system is set up in minutes and can be used by anyone with basic computer skills.
Virtually any smooth, non-metallic film may be measured. Examples include:
• Wafer Backgrinding/Packaging
|LIQUID CRYSTAL DISPLAYS
• Cell Gaps
• Hardness Coatings
• Anti-Reflection Coating
• Silicon Membranes
• AlN/ZnO Thin-Film Filters
The Filmetrics Advantage
|Thickness Measurement Range*:||5 nm-250 µm||5 nm-40 µm||20 nm-70 µm||20 nm-250 µm||100 nm-250 µm||0.2 μm-450 μm||5 μm-3 mm|
|Min. Thickness to Measure n and k*:||50 nm||50 nm||100 nm||100 nm||500 nm||2 μm||100 μm|
|Wavelength Range:||200-1700 nm||200-1100 nm||380-1050 nm||380-1700 nm||950-1700 nm||1440-1690 nm||1520-1580 nm|
|Accuracy*: The > of 0.4% or||1 nm||1 nm||2 nm||2 nm||3 nm||5 nm||50 nm|
|Precision1:||0.1 nm||0.2 nm||1 nm||5 nm|
|Stability2:||0.07 nm||0.12 nm||1 nm||5 nm|
|Spot Size:||Standard 1.5 mm (Smaller Available)||600 μm||25 μm|
|Light Source Lamp MTBF:||D2: 2000 hr, Halogen: 1200 hr||Halogen: 1200 hr||>10 years|
|200 mm Chuck||300 mm Chuck|
|Sample Size:||≤ 200 mm diameter||≤ 300 mm diameter|
Speed (Typical with
|5 points - 5 sec.
25 points - 14 sec.
56 points - 29 sec.
|5 points - 8 sec.
25 points - 21 sec.
56 points - 43 sec.
|Power Requirements:||100-240 VAC, 50-60 Hz, 230 Watts|
|Dimensions:||14W x 19D x 11H (in)
35.5W x 48.3D x 28H (cm)
|Weight:||35 lbs. (16 kg)|
|PC3:||Windows XP(SP2) - Windows 8(64-bit)|
|Mac:||OS X Lion/Mountain Lion running Parallels|
* Material dependent
1. 1σ of 100 measurements of 500 nm SiO -on-Si. Average of 1σ over 20 successive days.
2. 2σ of daily average of 100 measurements of 500 nm SiO2-on-Si over 20 successive days.
3. Windows Vista – Windows 8(64-bit) and a DirectX 10 graphics card required to render 3D wafer maps
LOW COST - HIGH ACCURACY
Filmetrics has made optical profilometry affordable.
The Profilm3D uses state-of-the-art vertical scanning interferometry (VSI) combined with optional high accuracy phase shifting interferometry (PSI) to provide access to surface topography on the sub-nanometer scale at an unheard of price.
The Profilm3D’s exceptionally wide field-of- view - 2 mm with 10x objective lens - and its digital zoom helps mitigate the need for multiple objective lenses for different applications, thus further reducing the overall cost of ownership. For those applications where the flexibility of multiple objective lenses is still required, manual and automatic turrets are available.
Objectives 3 (Nikon CF IC Epi Plan)