logo

Thin Film Measurement System

Thinfilm-metrology > Thin Film Measurement System

 

F10-RT Thin-Film Analyzer

 

Simultaneous Reflectance/Transmittance Measurements for Thin-Film Applications
The F10-RT requires only a mouse-click to capture both reflectance and transmittance spectra by eliminating timeconsuming changes in hardware configuration. Data capture is fast – the array-based spectrometers typically take less than a second.


The Analysis Advantage
The F10-RT brings the power of Filmetrics analysis to simultaneous reflectance and transmittance measurements. A click of the mouse instantly reports minimum and maximum reflectance and transmittance values in user-configurable wavelength ranges. Color analysis is standard and can be displayed in common color-space systems (e.g. CIELAB and CIEXYZ) as well as visually. Measured spectra and other data can easily be printed and exported or can be saved in JPEG image format for easy distribution. Optional film thickness and index solving modules give the F10-RT all of the advanced multi-film analytical power of the Filmetrics F20.


All in a Robust, Reliable Package

The F10-RT arrives complete with reference standards. Its small footprint and USB connectivity ensure effortless setup. With no moving parts, no maintenance other than lamp replacement is necessary and high reliability is guaranteed.

 

The Filmetrics Advantage

  • Built-in online diagnostics
  • Standalone software included
  • Sophisticated history function for saving, reproducing, and plotting results
  •  

     

     

    Thickness1
    Measurement Range*: 15 nm-70 μm
    Min. Thickness Req’d to Measure n and k*:           100 nm
    Accuracy*: Greater of 0.4% or 2 nm
    Precision2: 0.1 nm
    Stability3: 0.07 nm
    Spectrometer
    Wavelength Range§: 380-1050 nm
    Wavelength Accuracy: < 0.5 nm
    Wavelength Reproducibility: 0.1 nm
    Wavelength Resolution: 2.5 nm
    Photometric Accuracy: 0.005 A
    Noise: < 0.0002 A rms
    Stray Light: < 0.25% at 500 nm
    Amplitude Resolution: 14-bit
    General
    Probe Spot Size: 6 mm
    Light Source: Regulated Tungsten-Halogen
    Lamp Warm Up Time for High Precision: 15 minutes
    Power Requirements: 100-240 VAC, 50-60 Hz, 20W
    Computer Requirements
    Operating System:     Windows XP(SP2) - Windows 8 (64-bit)
    Processor Clock Speed: 1.4 GHz min
    System Memory: 512 MB min
    Hard Disk Space: 50 MB min
    Interface: USB 1.0 (USB 2.0 recommended)
    Screen Resolution: 1024 x 768 min
    Internet Access: Recommended for online support

     

    § UV, NIR, and EXR configurations available
    * Material dependent.
    1 Thickness & index solving are optional.
    2 1σ of 100 measurements of 500 nm SiO2-on-Si. Average of 1σ over 20 successive days.
    3 2σ of daily average of 100 measurements of 500 nm SiO2-on-Si over 20 successive days.

     

     

    F20 Thin-Film Analyzer

     

    An Advanced Thin-Film Measurement System at an Affordable Price
    Thickness and optical constants (n and k) are measured quickly and easily with the affordable F20 advanced spectrometry system. Spectral analysis of reflectance from the top and bottom of the thin film provides thickness,
    refractive index, and extinction coefficient in seconds.


    The included software and USB connectivity make installing the F20 onto any Windows-platform PC simple. The robust software comes preloaded with a library of over one hundred materials, which facilitates the measurements of many different layer structures, including single and multilayer stacks, and freestanding films. New materials can be added quickly by measuring the optical constants of samples or by importing data from an existing source.

     

    Example Layers
    Virtually any smooth, translucent, or lightly absorbing film may be measured. This includes most dielectrics and semiconductors, for example:

    SiO2 SiNX DLC
    Photoresist Polymer Layers Polyimide
    Polysilicon Amorphous Silicon Silicon

     

    Applications

    SEMICONDUCTOR FABRICATION
    • Photoresist
    • Oxides
    • Nitride
    SEMICONDUCTOR FABRICATION
    • Photoresist
    • Oxides
    • Nitride
       
    SEMICONDUCTOR FABRICATION
    • Photoresist
    • Oxides
    • Nitride
    SEMICONDUCTOR FABRICATION
    • Photoresist
    • Oxides
    • Nitride

     

    The Filmetrics Advantage

  • World’s leader in tabletop thin-film measurement
  • 24hr phone, e-mail, and online support
  • Intuitive analysis software standard with every system

  • Additional Features

  • Built-in online diagnostics
  • Standalone software included
  • Sophisticated history function for saving, reproducing, and plotting results

  •  

     

     

      F20-UV F20-UVX F20 F20-EXR F20-NIR F20-XT
    Thickness
    Measurement Range*:
    3 nm-
    40 μm
    3 nm-
    250 μm
    15 nm-
    70 μm
    15 nm-
    250 μm
    100 nm-
    250 μm
    0.2 μm -
    450 μm
    Min. Thickness to Measure n & k*: 50 nm 50 nm 100 nm 100 nm 500 nm 2 μm
    Accuracy*: The > of 0.2% or 1 nm 1 nm 2 nm 2 nm 3 nm 5 nm
    Precision1: 0.02 nm 0.02 nm 0.02 nm 0.02 nm 0.1 nm 1 nm
    Stability2: 0.05 nm 0.05 nm 0.05 nm 0.05 nm 0.12 nm 1 nm
    Spot Size: Standard 1.5 mm, Optional down to 20 μm 600 μm
    Sample Size: From 1 mm to 300 mm diameter and up
    Light Source Lamp MTBF: D2: 2000 hr, Halogen: 1200 hr Halogen: 1200 hr
    Spectrometer
    Wavelength Range: 200-
    1100 nm
    200-
    1700 nm
    380-
    1050 nm
    380-
    1700 nm
    950-
    1700 nm
    1440-
    1690 nm

     

     

    width="731" colspan="7">

    General Power Requirements: 100-240 VAC, 50-60 Hz, 0.3-0.1 A Interface:

    USB 2.0 Certifications: CE EMC and safety directives Operating System PC: Windows XP(SP2) - Windows 8(64-bit) Mac: OS X Lion/Mountain Lion running Parallels


    * Material dependent
    1 1σ of 100 measurements of 500 nm SiO2-on-Si. Average of 1σ over 20 successive days.
    2 2σ of daily average of 100 measurements of 500 nm SiO2-on-Si over 20 successive days.

     

     

    F50 Thin-Film Analyzer

     

    Automated Thin-Film Thickness Mapping System
    Thin-film thickness of samples up to 450 mm in diameter are mapped quickly and easily with the F50 advanced spectral reflectance system. The motorized r-theta stage moves automatically to selected measurement points and provides thickness measurements as fast as two points per second. The F50 has the same precision high-lifetime stage that performs millions of measurements in our production systems.


    Choose one of the dozens of predefined polar, rectangular, or linear map patterns, or create your own with no limit on the number of measurement points. The entire desktop system is set up in minutes and can be used by anyone with basic computer skills.

    Example Layers
    Virtually any smooth, non-metallic film may be measured. Examples include:

     

    SiO2 SiNX DLC
    Photoresist Polymer layers Polyimide
    Polysilicon Amorphous Silicon  

     

    SEMICONDUCTOR FABRICATION
    • Photoresist
    • Oxides/Nitrides/SOI
    • Wafer Backgrinding/Packaging
    LIQUID CRYSTAL DISPLAYS
    • Cell Gaps
    • Polyimide
    • ITO
       
    OPTICAL COATINGS
    • Hardness Coatings
    • Anti-Reflection Coating
    • Filters
    MEMS
    • Photoresist
    • Silicon Membranes
    • AlN/ZnO Thin-Film Filters


    The Filmetrics Advantage

  • 24-hour Support
  • Built-in online diagnostics
  • Standalone software included
  • Sophisticated history function for saving, reproducing,and plotting results
  •  

     

     

      F50-UVX    F50-UV     F50   F50-EXR  F50-NIR   F50-XT F50-XXT
    Thickness Measurement Range*: 5 nm-250 µm 5 nm-40 µm 20 nm-70 µm 20 nm-250 µm 100 nm-250 µm 0.2 μm-450 μm 5 μm-3 mm
    Min. Thickness to Measure n and k*: 50 nm 50 nm 100 nm 100 nm 500 nm 2 μm 100 μm
    Wavelength Range: 200-1700 nm 200-1100 nm 380-1050 nm 380-1700 nm 950-1700 nm 1440-1690 nm 1520-1580 nm
    Accuracy*: The > of 0.4% or 1 nm 1 nm 2 nm 2 nm 3 nm 5 nm 50 nm
    Precision1: 0.1 nm 0.2 nm 1 nm 5 nm
    Stability2: 0.07 nm 0.12 nm 1 nm 5 nm
    Spot Size: Standard 1.5 mm (Smaller Available) 600 μm 25 μm
    Light Source Lamp MTBF: D2: 2000 hr, Halogen: 1200 hr Halogen: 1200 hr >10 years

     

      200 mm Chuck 300 mm Chuck
    Sample Size: ≤ 200 mm diameter ≤ 300 mm diameter
    Speed (Typical with
    Vacuum Chuck):
    5 points - 5 sec.
    25 points - 14 sec.
    56 points - 29 sec.
    5 points - 8 sec.
    25 points - 21 sec.
    56 points - 43 sec.

     

    General
    Power Requirements: 100-240 VAC, 50-60 Hz, 230 Watts
    Dimensions: 14W x 19D x 11H (in)
    35.5W x 48.3D x 28H (cm)
    Weight: 35 lbs. (16 kg)
    Computer Requirements
    Interface: USB 2.0
    Operating System
    PC3: Windows XP(SP2) - Windows 8(64-bit)
    Mac: OS X Lion/Mountain Lion running Parallels

     

    * Material dependent

     

    1. 1σ of 100 measurements of 500 nm SiO -on-Si. Average of 1σ over 20 successive days.


    2. 2σ of daily average of 100 measurements of 500 nm SiO2-on-Si over 20 successive days.


    3. Windows Vista – Windows 8(64-bit) and a DirectX 10 graphics card required to render 3D wafer maps


     

    3D OPTICAL PROFILER

    LOW COST - HIGH ACCURACY

    Filmetrics has made optical profilometry affordable.

    The Profilm3D uses state-of-the-art vertical scanning interferometry (VSI) combined with optional high accuracy phase shifting interferometry (PSI) to provide access to surface topography on the sub-nanometer scale at an unheard of price.

     

    LARGEST FIELD-OF-VIEW

    The Profilm3D’s exceptionally wide field-of- view - 2 mm with 10x objective lens - and its digital zoom helps mitigate the need for multiple objective lenses for different applications, thus further reducing the overall cost of ownership. For those applications where the flexibility of multiple objective lenses is still required, manual and automatic turrets are available.


    Performance Specifications

    Optional Accessories

  • PSI measurement capability, with tip-tilt stage
  • Automatic 100 mm x 100 mm XY stage
  • Manual 4-position turret with position sensing
  • Automatic 4-position turret with position sensing

  • Objectives 3 (Nikon CF IC Epi Plan)


  • Optional
  • 8 µm step
  • Sold separately
  • Pixel size on sample

  • 4D TRIBOLOGY
    Electrochemistry
    4D CELL IMAGING
    MEMS Actuator
    MEMS Cantilevers
    for more information www.filmetrics.com
    Get in Touch