F30 Thickness Measurement Instrument Series

Download Brochure The Most Powerful Instruments Available for Monitoring Thin-Film Deposition Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.   Example Layers MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured with the F30 thickness measurement series instruments. This includes virtually any semiconducting material, from AIGaN to GaInAsP.  

Model Specifications:

Model  Thickness Range  Wavelength Range
F30 15nm - 70µm 380-1050nm
F30-UV 3nm - 40µm 190-1100nm
F30-NIR 100nm - 250µm 950-1700nm
F30-EXR 15nm - 250µm 380-1700nm
F30-UVX 3nm - 250µm 190-1700nm
F30-XT .2µm - 450µm 1440-1690nm
* Film stack dependent   Benefits:
  • Dramatically improves productivity
  • Low cost - Can pay for itself in months
  • Accurate - Measure to better than ±1%
  • Fast-Measurements in seconds
  • Non-Invasive - Totally outside of deposition chamber
  • Easy to use - Intuitive Windows® software
  • Turn-key system sets up in minutes
  Common Optional Accessories:
  • NIST-Traceable Thickness Standard
  • Lens Assemblies

Sinsil International

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