F30 Thickness Measurement Instrument Series

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The Most Powerful Instruments Available for Monitoring Thin-Film Deposition

Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.

Example Layers

MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured with the F30 thickness measurement series instruments. This includes virtually any semiconducting material, from AIGaN to GaInAsP.

Model Specifications:

* Film stack dependent

Benefits:

• Dramatically improves productivity
• Low cost – Can pay for itself in months
• Accurate – Measure to better than ±1%
• Fast-Measurements in seconds
• Non-Invasive – Totally outside of deposition chamber
• Easy to use – Intuitive Windows® software
• Turn-key system sets up in minutes

Common Optional Accessories:

• NIST-Traceable Thickness Standard
• Lens Assemblies