F30 Thickness Measurement Instrument Series

Download Brochure The Most Powerful Instruments Available for Monitoring Thin-Film Deposition Measure deposition rates, film thickness, optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time with the F30 spectral reflectance system.   Example Layers MBE and MOCVD: Smooth and translucent, or lightly absorbing films, may be measured with the F30 thickness measurement series instruments. This includes virtually any semiconducting material, from AIGaN to GaInAsP.  

Model Specifications:

• Dramatically improves productivity
• Low cost - Can pay for itself in months
• Accurate - Measure to better than ±1%
• Fast-Measurements in seconds
• Non-Invasive - Totally outside of deposition chamber
• Easy to use - Intuitive Windows® software
• Turn-key system sets up in minutes

• NIST-Traceable Thickness Standard
• Lens Assemblies