F3-sX Film

The F3-sX family measures semiconductor and dielectric layers up to 3 mm thick. Such thick layers tend to be rougher and less uniform than thinner layers, which the F3-sX counters with a 10-µm-diameter measurement spot. With it the F3-sX family easily measures materials that are impossible to measure with other instruments.

Sinsil International

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Description

The F3-sX family measures semiconductor and dielectric layers up to 3 mm thick. Such thick layers tend to be rougher and less uniform than thinner layers, which the F3-sX counters with a 10-µm-diameter measurement spot. With it the F3-sX family easily measures materials that are impossible to measure with other instruments.

F3-sX family uses near-infrared (NIR) light to measure layer thickness – even many layers that are opaque to the eye (such as semiconductors). The 980 nm wavelength version, the F3-s980, is designed for cost-sensitive applications.

Thickness Range-10µm – 1mm/15µm – 2mm/25µm – 3mm

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